ASTM: D5544:  Residue in Water

  • Summary
  • Analytes
  • Revision
  • Data and Sites
Official Method Name
Standard Test Method for On-Line Measurement of Residue After Evaporation of High-Purity Water
Current Revision
Reapproved 1999. Current edition approved Sept. 15, 1994. Published November 1994.
Media
WATER
Instrumentation
CNC (Condensation Nucleus Counter)
Method Subcategory
Inorganic
Method Source
  ASTM
Citation
  Annual Book of ASTM Standards, Section 11, Water and Environmental Technology, Volume 11.01, Water (I)
Brief Method Summary
This test method consists of continuously removing a representative sample of high-purity water from a pressurized supply line. The temperature of the incoming high-purity water should ideally be at room temperature, but not more than 50oC. The high-purity water is subsequently cooled to a constant temperature of 18oC. An atomizer is supplied with the cooled high-purity water at a constant flow rate, and a source of compressed air, or nitrogen, at a constant flow rate and pressure, to generate a stable aerosol of high-purity water droplets. Under these conditions, the atomizer produces a polydisperse size distribution of droplets with a median size of approximately 1 um, and a concentration of approximately 107 droplets/s, or 1012 droplets/mL.
The droplets enter a drying column; are rapidly mixed with dried, filtered, heated (normally at 120oC) compressed air, or nitrogen; and dried within the first few centimetres of the drying column. The temperature of the drying column can be set at lower temperatures (95, 70, or 45oC) if information concerning the dissolved organic fraction of residue is required. Each atomizer droplet produces a particle of nonvolatile residue. As the residue particles emerge from the drying column, a small percentage is removed and passed through a diffusion screen before being counted by a condensation nucleus counter (CNC).
Scope and Application
This test method covers the determination of dissolved organic and inorganic matter and colloidal material found in high-purity water used in the semiconductor, aerospace, and other industries. This material is referred to as residue after evaporation (RAE). The range of the test method is from 0.1 ug/L(ppb) to 20 mg/L (ppm). This test method uses a continuous, real time monitoring technique to measure the concentration of RAE. A pressurized sample of high-purity water is supplied to the test method's apparatus continuously through ultra-clean fittings and tubing. Contaminants from the atmosphere are therefore prevented from entering the sample.
Applicable Concentration Range
0.1-20,000 ug/L
Interferences
None indicated.
Quality Control Requirements
Sample Handling
High-purity water must be supplied through ultra-clean fittings made of a material that will not contaminate the water. Perfluoroalkoxy (PFA) has been used successfully with this test method. PFA is a fully fluorinated, translucent polymer of exceptional purity. It does not release a gas and is resistant to virtually all chemicals and solvents.
High-purity water should not be exposed to the atmosphere because it picks up contamination readily. This test method requires a continuous flow of high-purity water through a sealed, on-line installation to prevent such contamination.
This test method requires a non-contaminating pressure regulator because high-purity water must be supplied to the atomizer at a constant flow rate. Pressure fluctuations in the high-purity water supply must not be allowed to affect the flow rate of water supplied to the atomizer because pressure fluctuations will affect the size of water droplets produced by the atomizer, making the calibration inaccurate.
The atomizer requires a source of high-pressure compressed air, or nitrogen, regulated at a constant pressure to generate a stable aerosol of high-purity water droplets with a median size of approximately 1 um.
Water entering the atomizer must be at a temperature of 18 +/- 1oC, to control surface tension in the high-purity water. Changes in surface tension affect the size distribution of water droplets.
Using long sample lines with low sample velocity to divert the flow of high-purity water to the test apparatus is not recommended, as this allows contaminants to accumulate in the sample lines. Sample lines should therefore be less than 2 m long, and line velocity should be greater than 10 cm/s. If the instrumentation for this test method cannot be sited close to the high-purity water supply, a sample line with a velocity of at least 1.8 m/s should bring the high-purity water to a tee connection (to high-purity water and to drain).
Maximum Holding Time
Relative Cost
$51 to $200
Sample Preparation Methods